Third-harmonic UV generation in silicon nitride nanostructures
Ning, Tingyin; Hyvärinen, Outi; Pietarinen, Henna; Kaplas, Tommi; Kauranen, Martti; Genty, Goery (2013)
Lataukset:
Ning, Tingyin
Hyvärinen, Outi
Pietarinen, Henna
Kaplas, Tommi
Kauranen, Martti
Genty, Goery
2013
Julkaisun pysyvä osoite on
https://urn.fi/URN:NBN:fi:tty-201308201286
https://urn.fi/URN:NBN:fi:tty-201308201286
Kuvaus
Peer reviewed
Tiivistelmä
We report on strong UV third-harmonic generation from silicon nitride films and resonant waveguide gratings. We determine the absolute value of third-order susceptibility of silicon nitride at wavelength of 1064 nm to be χ⁽³⁾ (-3ω,ω,ω,ω) = (2.8 ± 0.6) × 10⁻²⁰ m²/V², which is two orders of magnitude larger than that of fused silica. The third-harmonic generation is further enhanced by a factor of 2000 by fabricating a resonant waveguide grating onto a silicon nitride film. Our results extend the operating range of CMOS-compatible nonlinear materials to the UV spectral regime.
Kokoelmat
- TUNICRIS-julkaisut [16944]