Application of ultra-thin aluminum oxide etch mask made by atomic layer deposition technique

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A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
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Date
2007
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Language
en
Pages
369-373
Series
Journal of Physics: Conference Series, Volume 61
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Grigoras , K , Sainiemi , L , Tiilikainen , J , Säynätjoki , A , Airaksinen , V-M & Franssila , S 2007 , ' Application of ultra-thin aluminum oxide etch mask made by atomic layer deposition technique ' , Journal of Physics: Conference Series , vol. 61 , pp. 369-373 . https://doi.org/10.1088/1742-6596/61/1/074